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Yang et al. Microstructures 2023;3:2023005  https://dx.doi.org/10.20517/microstructures.2022.24  Page 7 of 10

               CONCLUSIONS
               In conclusion, we have demonstrated a UV-visible distinguishable broadband photodetector utilizing the
               NPC and PPC response in a graphene/ZnO QD heterostructure. The photoresponsive mechanism of the
               photodetector under visible illumination is attributed to adsorbents on the graphene, which act as scattering
               centers in illumination conditions to decrease the conductivity. In contrast, under UV illumination, the
               photogenerated electrons in the ZnO QDs could transfer to the graphene, leading to an increase in
               conductivity. Thus, the current of the graphene/ZnO QDs photodetector decreases under visible
               illumination and increases under UV illumination, which can be used to detect and distinguish UV and
               visible illumination. Our results may expand the application area of broadband photodetectors.

               MATERIALS AND METHODS
               Device Fabrication: Graphene was grown on copper foils via a chemical vapor deposition method and
               transferred to Si(n+)/SiO  (300 nm) substrates via the solution method. Then, two Ti/Au electrodes were
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               prepared onto the graphene by thermal evaporation using a mask. Another Ti/Au electrode was deposited
               on the Si substrate as a gate electrode [Figure 1A]. The device active area is 100 µm in length and 1200 µm in
               width defined as the area between the two electrodes. ZnO QDs were synthesized by a traditional sol-gel
               method using zinc acetate and KOH as reactants. To fabricate the graphene/ZnO QD photodetector, the
               ZnO QDs dispersed in an ethanol solution (2 mg/mL) were spin-coated over the graphene at 2000 rpm for
               20 s and baked at 70 °C for 10 min. This process was repeated three times to ensure that the graphene was
               covered by sufficient ZnO QDs. The final thickness of the ZnO QD film is ~120 nm.

               Device Characterization: The electrical transport characteristics of the device were studied using a
               semiconductor characterization system (Keithley 4200-SCS). Handhold lasers and LEDs with different
               wavelengths were employed as the light sources. The X-ray diffraction (XRD) pattern of the ZnO QDs was
               obtained using a diffractometer (X’Pert Pro, PANalytical). The Raman spectra were recorded using an SOL
               instrument spectrometer (Confotec MR520) using a 532-nm laser as the excitation source. X-ray
               photoelectron  spectroscopy  (XPS)  spectra  were  carried  out  using  an  XPS  spectrometer
               (Thermo ESCALAB 250) and calibrated based on the C 1s peak at 284.8 eV. The absorption spectra of the
               ZnO QDs were measured using a spectrophotometer (Hitachi UH4150). The morphology of the ZnO QDs
               was investigated using transmission electron microscopy (TEM, JEOL 2100). All the photoresponsive
               measurements were carried out at room temperature and in air.


               DECLARATIONS
               Authors’ contributions
               Design, writing review and editing: Yang X, Cheng S, Shan CX
               Data analysis: Yang X, Yang XG, Cheng S
               Data acquisition: Yang X, Wang CJ
               Sample fabrication: Wang CJ, Zang JH


               Availability of data and materials
               Not applicable.


               Financial support and sponsorship
               This work was supported by National Natural Science Foundation of China (Nos. 62271450, 12174348) and
               Henan Center for Outstanding Overseas Scientists (No. GZS201903).
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