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Dang et al. Chem Synth 2023;3:14 https://dx.doi.org/10.20517/cs.2022.33 Page 7 of 20
Figure 3. (A) (i) Schematic illustration of self-seeding solution-phase method [68] ; (ii) SEM image of Se nanowires; Copyright 2002,
Wiley-VCH. (B) (i) Schematic of the plasma-assisted selenization process [69] ; (ii) A top view SEM image of Se nanowires and a
magnified TEM image of single Se nanowire with the lattice spacings of 0.351 nm of (110) and 0.502 nm of (001); Copyright 2018,
American Chemical Society. (C) (i) Schematic illustration of thermally drawn-assisted method [70] ; (ii) SEM image of Se nanowire arrays
and inset is TEM image of a single nanowire with 32 nm thickness; (iii) Cross-sectional SEM micrograph of Se nanowires; Copyright
2011, Nature Publishing Group.
approach has been developed to fabricate well-ordered, highly uniform Se nanowires and nanotubes
[70]
[Figure 3C (i)] . This method involves multistep iterative co-drawing of Se embedded in a polymeric
cladding that supports most of the stress resulting from thermal drawing. Starting with a Se macroscopic
