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Luo et al. Microstructures 2023;3:2023011  https://dx.doi.org/10.20517/microstructures.2022.41  Page 11 of 13

               CONCLUSIONS
               In conclusion, hollow Ni N-Co N /NC nanoflower was synthesized by pyrolyzing nickel/cobalt-TEOA
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               complex precursor using urea as the nitrogen source and applied as positive electrode material for
               supercapacitor. Thanks to the remarkable electronic conductivity originating from metal nitrides and
               N-doped carbon and copious active sites provided by self-assembled nanosheets and porous structure, the
               Ni N-Co N /NC exhibits appreciable electrochemical performance. In a three-electrode system, the
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               Ni N-Co N /NC delivers a high specific capacitance of 1582 F g  at 1 A g  and excellent cycle stability
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               (83.79% after 5000 cycles at 10 A g ). Additionally, when fabricated as Ni N-Co N /NC//AC ASC device, it
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               displays a favorable energy density of 32.4 W h Kg  at a power density of 851.3 W Kg  and outstanding
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               capacitance retention (95.8% after 5000 cycles at 10 A g ). This work may create ideas to prepare metal
               nitride-based nanomaterials using nontoxic nitrogen source and pave the way for the rational design of
               hollow inorganic materials/carbon composites with high performance for SCs.
               DECLARATIONS
               Authors’ contributions
               Designed the study and supervised the overall project: Zhu M
               Performed the experiments, collected data, and drafted the manuscript: Luo Q
               Contributed to the result discussion: Luo Q, Lu C, Liu L, Zhu M
               Availability of data and materials
               Not applicable.
               Financial support and sponsorship
               The authors acknowledge the financial support from the Nation Natural Science Foundation of China
               (21403091).

               Conflicts of interest
               All authors declared that there are no conflicts of interest.


               Ethical approval and consent to participate
               Not applicable.


               Consent for publication
               Not applicable.


               Copyright
               © The Author(s) 2023.


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