﻿<article xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">
  <front>
    <journal-meta>
      <journal-id journal-id-type="nlm-ta">Microstructures</journal-id>
      <journal-id journal-id-type="publisher-id">MICROSTRUCTURES</journal-id>
      <journal-title-group>
        <journal-title>Microstructures</journal-title>
      </journal-title-group>
      <issn pub-type="epub">2770-2995</issn>
      <publisher>
        <publisher-name>OAE Publishing Inc.</publisher-name>
      </publisher>
    </journal-meta>
    <article-meta>
      <article-id pub-id-type="doi">10.20517/microstructures.2026.45</article-id>
      <article-categories>
        <subj-group>
          <subject>Research Article</subject>
        </subj-group>
      </article-categories>
      <title-group>
        <article-title>Topological insulator modified nickel oxide nanoflowers for low-temperature hydrogen sulfide gas sensing</article-title>
      </title-group>
      <contrib-group>
        <contrib contrib-type="author">
          <name>
            <surname>Wang</surname>
            <given-names>Mei</given-names>
          </name>
          <xref ref-type="aff" rid="I1">
            <sup>1</sup>
          </xref>
          <xref ref-type="aff" rid="I2">
            <sup>2</sup>
          </xref>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Ding</surname>
            <given-names>Wendou</given-names>
          </name>
          <xref ref-type="aff" rid="I1">
            <sup>1</sup>
          </xref>
          <xref ref-type="aff" rid="I2">
            <sup>2</sup>
          </xref>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Fan</surname>
            <given-names>Ruoyue</given-names>
          </name>
          <xref ref-type="aff" rid="I1">
            <sup>1</sup>
          </xref>
          <xref ref-type="aff" rid="I2">
            <sup>2</sup>
          </xref>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Wu</surname>
            <given-names>Chengye</given-names>
          </name>
          <xref ref-type="aff" rid="I1">
            <sup>1</sup>
          </xref>
          <xref ref-type="aff" rid="I2">
            <sup>2</sup>
          </xref>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Yan</surname>
            <given-names>Rong</given-names>
          </name>
          <xref ref-type="aff" rid="I1">
            <sup>1</sup>
          </xref>
          <xref ref-type="aff" rid="I2">
            <sup>2</sup>
          </xref>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Zou</surname>
            <given-names>Wei</given-names>
          </name>
          <xref ref-type="aff" rid="I1">
            <sup>1</sup>
          </xref>
          <xref ref-type="aff" rid="I2">
            <sup>2</sup>
          </xref>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Yang</surname>
            <given-names>Huai</given-names>
          </name>
          <xref ref-type="aff" rid="I1">
            <sup>1</sup>
          </xref>
          <xref ref-type="aff" rid="I2">
            <sup>2</sup>
          </xref>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Han</surname>
            <given-names>Changcun</given-names>
          </name>
          <xref ref-type="aff" rid="I1">
            <sup>1</sup>
          </xref>
          <xref ref-type="aff" rid="I2">
            <sup>2</sup>
          </xref>
        </contrib>
        <contrib contrib-type="author" corresp="yes">
          <name>
            <surname>Cheng</surname>
            <given-names>Zhengwang</given-names>
          </name>
          <xref ref-type="aff" rid="I1">
            <sup>1</sup>
          </xref>
          <xref ref-type="aff" rid="I2">
            <sup>2</sup>
          </xref>
          <xref ref-type="corresp" rid="cor1" />
        </contrib>
        <contrib contrib-type="author" corresp="yes">
          <name>
            <surname>Ma</surname>
            <given-names>Xinguo</given-names>
          </name>
          <xref ref-type="aff" rid="I1">
            <sup>1</sup>
          </xref>
          <xref ref-type="aff" rid="I2">
            <sup>2</sup>
          </xref>
          <xref ref-type="corresp" rid="cor1" />
        </contrib>
        <contrib contrib-type="author" corresp="yes">
          <name>
            <surname>Li</surname>
            <given-names>Long</given-names>
          </name>
          <xref ref-type="aff" rid="I3">
            <sup>3</sup>
          </xref>
          <xref ref-type="corresp" rid="cor1" />
        </contrib>
        <contrib contrib-type="author" corresp="yes">
          <name>
            <surname>Pan</surname>
            <given-names>Minghu</given-names>
          </name>
          <xref ref-type="aff" rid="I4">
            <sup>4</sup>
          </xref>
          <xref ref-type="corresp" rid="cor1" />
        </contrib>
      </contrib-group>
      <aff id="I1">
        <sup>1</sup>School of Science, Hubei University of Technology, Wuhan 430068, Hubei, China.</aff>
      <aff id="I2">
        <sup>2</sup>Institute of Low-Dimensional Quantum Materials (LQM), Hubei University of Technology, Wuhan 430068, Hubei, China.</aff>
      <aff id="I3">
        <sup>3</sup>College of Electrical and Electronic Engineering, Wenzhou University, Wenzhou 325035, Zhejaing, China.</aff>
      <aff id="I4">
        <sup>4</sup>School of Physics and Information Technology, Shaanxi Normal University, Xi’an 710119, Shaanxi, China.</aff>
      <author-notes>
        <corresp id="cor1">Correspondence to: Prof. Zhengwang Cheng, Prof. Xinguo Ma, School of Science, Hubei University of Technology, Wuhan 430068, Hubei, China; Institute of Low-Dimensional Quantum Materials (LQM), Hubei University of Technology, Wuhan 430068, Hubei, China. E-mail: <email>zwcheng@hbut.edu.cn</email>; <email>maxg@hbut.edu.cn</email>; Dr. Long Li, College of Electrical and Electronic Engineering, Wenzhou University, Wenzhou 325035, Zhejaing, China. E-mail: <email>longliedu@163.com</email>; Prof. Minghu Pan, School of Physics and Information Technology, Shaanxi Normal University, Xi’an 710119, Shaanxi, China. E-mail: <email>minghupan@snnu.edu.cn</email></corresp>
        <fn fn-type="other">
          <p>
            <bold>Received:</bold> 26 Mar 2026 |  <bold>First Decision:</bold> 20 May 2026 |  <bold>Revised:</bold> 1 Aug 2026 |  <bold>Accepted:</bold> 5 Aug 2026 |  <bold>Published:</bold> 20 Sep 2026</p>
        </fn>
        <fn fn-type="other">
          <p>
            <bold>Academic Editors:</bold> Min Hyuk Park, Shiqing Deng | <bold>Copy Editor:</bold> Ping Zhang |  <bold>Production Editor:</bold> Ping Zhang</p>
        </fn>
      </author-notes>
	  <pub-date pub-type="ppub">
        <year>2026</year>
      </pub-date>
      <pub-date pub-type="epub">
        <day>20</day>
        <month>9</month>
        <year>2026</year>
      </pub-date>
      <volume>6</volume>
	  <issue>5</issue>
      <elocation-id>20260124</elocation-id>
      <permissions>
        <copyright-statement>© The Author(s) 2026.</copyright-statement>
        <license xlink:href="https://creativecommons.org/licenses/by/4.0/">
          <license-p>© The Author(s) 2026. <bold>Open Access</bold> This article is licensed under a Creative Commons Attribution 4.0 International License (<uri xlink:href="https://creativecommons.org/licenses/by/4.0/">https://creativecommons.org/licenses/by/4.0/</uri>), which permits unrestricted use, sharing, adaptation, distribution and reproduction in any medium or format, for any purpose, even commercially, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.</license-p>
        </license>
      </permissions>
      <abstract>
        <p>Developing low-cost, highly responsive low-temperature H<sub>2</sub>S sensors is critical due to rising air pollution, as well as the high energy consumption and safety risks associated with conventional semiconductor sensors. Non-stoichiometric NiO<sub>x</sub> offers enhanced carrier concentration and active sites via nickel vacancies, thereby improving low-temperature sensitivity. Composite sensors were fabricated by incorporating various mass fractions of the topological insulator Bi<sub>2</sub>Te<sub>3</sub> into NiO<sub>x</sub>. The 10% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> sensor delivered the best performance [11.81 response to 10 ppm H<sub>2</sub>S at 90 °C, 30% relative humidity (RH)], surpassing most reported H<sub>2</sub>S sensors. Its sensitivity is attributed to enhanced carrier mobility and Bi<sub>2</sub>Te<sub>3</sub> Dirac point shift upon H<sub>2</sub>S physisorption. With excellent H<sub>2</sub>S selectivity and stability, this composite offers a safer, energy-efficient, low-temperature alternative to high-temperature sensors.</p>
      </abstract>
      <kwd-group>
        <kwd>Gas sensor</kwd>
        <kwd>nickel oxide</kwd>
        <kwd>topological insulator</kwd>
        <kwd>bismuth telluride</kwd>
        <kwd>carrier mobility</kwd>
        <kwd>Dirac point</kwd>
      </kwd-group>
    </article-meta>
  </front>
  <body>
    <sec id="sec1">
      <title>INTRODUCTION</title>
      <p>Modern industrialization has improved convenience but worsened air quality. Hydrogen sulfide (H<sub>2</sub>S), a toxic reducing agent that smells of rotten eggs, threatens both the environment and public health. Semiconductor-based gas sensors have drawn significant interest, with performance enhanced via heterojunction construction<sup>[<xref ref-type="bibr" rid="B1">1</xref>]</sup>, element doping<sup>[<xref ref-type="bibr" rid="B2">2</xref>]</sup>, and morphology modification<sup>[<xref ref-type="bibr" rid="B3">3</xref>]</sup>. However, these sensors typically require high operating temperatures (200-400 °C) for optimal sensitivity. Given the diffusivity and explosivity of H<sub>2</sub>S in air, high-temperature operation poses safety risks. Heating consumes substantial energy, shortens sensor lifespan, and degrades performance. Thus, low-cost, highly responsive H<sub>2</sub>S sensors operable at low temperatures are urgently needed.</p>
      <p>As a p-type semiconductor, NiO offers high thermochemical stability and favorable electrochemistry, making it a preferred sensing material for CO, NO<sub>2</sub>, and H<sub>2</sub> detection<sup>[<xref ref-type="bibr" rid="B4">4</xref>-<xref ref-type="bibr" rid="B6">6</xref>]</sup>. However, NiO-based H<sub>2</sub>S sensors are seldom documented. Notable examples include NiO thin films on Ni foil fabricated via thermal evaporation<sup>[<xref ref-type="bibr" rid="B7">7</xref>]</sup> and NiO nanoparticles (7-50 nm) prepared via chemical co-precipitation<sup>[<xref ref-type="bibr" rid="B8">8</xref>]</sup>. Most existing H<sub>2</sub>S sensors, however, require high-temperature operation, including post-growth of metal oxide particles, compromising stability and durability and elevating fire risk in flammable-gas environments. Low-temperature NiO-based H<sub>2</sub>S sensors are therefore imperative.</p>
      <p>Defect concentration critically influences semiconductor properties<sup>[<xref ref-type="bibr" rid="B9">9</xref>]</sup>; specifically, the carrier concentration in the sensitive layer is critical for gas sensitivity. In non-stoichiometric NiO<sub>x</sub>, nickel vacancies at cation sites increase both active sites and carrier concentration, enhancing H<sub>2</sub>S sensitivity, as recent studies confirm. Mokoena <italic>et al.</italic> synthesized p-type NiO nanostructures with abundant nickel vacancies via co-precipitation, achieving exceptional H<sub>2</sub>S selectivity at operating temperatures<sup>[<xref ref-type="bibr" rid="B10">10</xref>]</sup>. Amu-Darko <italic>et al.</italic> reported flower-like ZnO-NiO sensors with high sensitivity, selectivity, and stability toward H<sub>2</sub>S gas at an optimal temperature of 250 °C<sup>[<xref ref-type="bibr" rid="B11">11</xref>]</sup>. These studies underscore the superior H<sub>2</sub>S sensitivity of non-stoichiometric NiO<sub>x</sub>-based sensors toward reducing gases.</p>
      <p>As a topological insulator, Bi<sub>2</sub>Te<sub>3</sub> features an insulating bulk with metallic conductive surfaces<sup>[<xref ref-type="bibr" rid="B12">12</xref>,<xref ref-type="bibr" rid="B13">13</xref>]</sup>. Strong spin-orbit coupling generates topologically protected surface states that suppress defect-induced electron backscattering and lower surface resistivity<sup>[<xref ref-type="bibr" rid="B14">14</xref>,<xref ref-type="bibr" rid="B15">15</xref>]</sup>. These time-reversal symmetry-protected states enhance surface carrier concentration and amplify reactive sites for H<sub>2</sub>S interaction. Gas adsorption modulates the Dirac point energy of topological insulators, with reducing gases acting as n-type dopants<sup>[<xref ref-type="bibr" rid="B16">16</xref>]</sup> and oxidizing gases as p-type dopants<sup>[<xref ref-type="bibr" rid="B15">15</xref>]</sup>. For Bi<sub>2</sub>Te<sub>3</sub>, n-type doping from H<sub>2</sub>S lowers the Dirac point, facilitating charge transfer and larger resistance changes, thereby enhancing the sensing response. This makes Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> heterojunctions highly promising for H<sub>2</sub>S detection.</p>
      <p>Non-stoichiometric NiO<sub>x</sub> nanoparticles were synthesized via chemical co-precipitation, and Bi<sub>2</sub>Te<sub>3</sub> nanoparticles via hydrothermal synthesis. Composites with Bi<sub>2</sub>Te<sub>3</sub> 0, 1, 5, 10, and 15 wt% relative to NiO<sub>x</sub> were fabricated and drop-cast onto substrates for gas sensor fabrication. To identify the optimal Bi<sub>2</sub>Te<sub>3</sub> loading, gas-sensing performance was evaluated via dynamic resistance changes to H<sub>2</sub>S at 90 °C and 30% relative humidity (RH). The 10 wt% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> sensor yielded the highest response (11.81 to 10 ppm H<sub>2</sub>S), substantially outperforming other compositions, while also exhibiting strong selectivity and excellent stability.</p>
    </sec>
    <sec id="sec2">
      <title>MATERIALS AND METHODS</title>
      <sec id="sec2-1">
        <title>Synthesis of non-stoichiometric NiO<sub>x</sub></title>
        <p>NiO<sub>x</sub> nanoparticles were synthesized <italic>via</italic> chemical co-precipitation. First, 0.125 mol of Ni(NO<sub>3</sub>)<sub>2</sub>•6H<sub>2</sub>O was dissolved in 25 mL of deionized water and stirred for 30 min to obtain a dark green transparent solution. A 10 mol L<sup>-1</sup> KOH solution was added dropwise to the solution until the pH reached 10. After another 30 min of stirring, the bright green turbid solution was centrifuged and washed three times with deionized water at 1,500 rpm. The precipitate was redispersed in water, dried at 80 °C for 8 h, ground and sieved through a 300-mesh screen to yield Ni(OH)<sub>2</sub> nanopowder. This powder was calcined at 240 °C for 2 h to yield black NiO<sub>x</sub> nanoparticles (top row, <inline-supplementary-material content-type="local-data" mimetype="application/pdf" xlink:href="microstructures6045-SupplementaryMaterials.pdf">Supplementary Figure 1</inline-supplementary-material>).</p>
      </sec>
      <sec id="sec2-2">
        <title>Synthesis of Bi<sub>2</sub>Te<sub>3</sub></title>
        <p>Bi<sub>2</sub>Te<sub>3</sub> nanoparticles were synthesized hydrothermally. First, 0.96 g of polyvinyl pyrrolidone (PVP) was dissolved in 42 mL of ethylene glycol under stirring for 30 min. Subsequently, 1.18 mmol of Bi<sub>2</sub>O<sub>3</sub> and 3.6 mmol of TeO<sub>2</sub> were introduced and stirred for another 45 min, followed by the addition of 6 mL of 4 mol NaOH solution, yielding a yellow suspension after stirring at 300 rpm at 25 °C for 30 min. This suspension was transferred to a hydrothermal reactor and kept at 200 °C for 4 h. After natural cooling, the product was centrifuged with ethanol at 2,000 rpm for 4 min; this process was repeated three times to ensure purity. The product was then dispersed in ethanol, vacuum-dried at 60 °C for 8 h, ground, and sieved through a 250-mesh sieve to obtain a grayish-black Bi<sub>2</sub>Te<sub>3</sub> nanopowder.</p>
      </sec>
      <sec id="sec2-3">
        <title>Fabrication and measurement of gas sensor</title>
        <p>Bi<sub>2</sub>Te<sub>3</sub> nanopowder was mixed with NiO<sub>x</sub> nanopowder at mass fractions of 0, 1, 5, 10, and 15 wt%. The mixtures were dispersed in solution at 20 mg/mL and ultrasonicated for 30 min. NiO<sub>x</sub> sensors with varying Bi<sub>2</sub>Te<sub>3</sub> doping levels were fabricated by drop-casting the respective dispersions onto the sensor chip using disposable syringes. The resulting sensors were labeled as 1%, 5%, 10%, and 15% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> sensors.</p>
        <p>
          <inline-supplementary-material content-type="local-data" mimetype="application/pdf" xlink:href="microstructures6045-SupplementaryMaterials.pdf">Supplementary Figure 1</inline-supplementary-material> (bottom) presents the sensor testing system, in which the micro-electro-mechanical systems (MEMS) chip is wired to a four-pin in-line socket base for performance evaluation. The prepared powder was weighed, mixed with anhydrous ethanol, and sonicated to form a uniform dispersion, which was then drop-cast onto the MEMS chips using a syringe. The coated MEMS devices were placed in an eight-channel test chamber for simultaneous testing of up to eight chips. The chamber included temperature and humidity sensors, with an external direct current power supply driving the test electrodes. Heating was regulated via a wireless-controlled module, and output signals were processed by dedicated software and transmitted wirelessly to a computer for real-time data monitoring. The computer terminal automatically adjusted multiple mass flow controllers according to preset gas parameters to maintain stable target gas concentration. Relative humidity was regulated by passing dry air through a humidity generator [<inline-supplementary-material content-type="local-data" mimetype="application/pdf" xlink:href="microstructures6045-SupplementaryMaterials.pdf">Supplementary Figure 1</inline-supplementary-material>]. Sensor response to reducing gases is defined as the ratio of resistance in the target gas to that in air, and inversely for oxidizing gases. Response time is the duration required to reach 90% of the response value, while recovery time is the time needed to return to 10% of the response value.</p>
      </sec>
      <sec id="sec2-4">
        <title>Characterizations</title>
        <p>The crystal structures of NiO<sub>x</sub> and Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> were analyzed via wide-range X-ray diffraction (XRD) patterns (Bruker D8 ADVANCE) using Cu Kα radiation at 40 kV and 40 mA with θ-2θ scans from 20° to 70°. Surface morphology and microstructure were conducted using a ZEISS GeminiSEM 300 field emission scanning electron microscope (SEM). SEM imaging was performed at 10 kV and 100,000× magnification. Transmission electron microscopy (TEM) analysis was executed on a Talos F200X instrument (Thermo Fisher) at 200 kV. Carrier mobility was measured using an HMS-7000 Optical Hall Effect tester (Ecopia). Electrochemical impedance spectroscopy (EIS) and photocurrent intensity response measurements were carried out on a CHI660E electrochemical workstation using a three-electrode system. Test samples were coated onto clean fluorinated tin oxide glass as the working electrode, with a platinum plate as the counter electrode and a silver/silver chloride (Ag/AgCl) electrode as the reference. The Brunauer-Emmett-Teller (BET) specific surface areas were determined from nitrogen adsorption isotherms using a Micromeritics Accelerated Surface Area and Porosimetry 2460 instrument.</p>
      </sec>
    </sec>
    <sec id="sec3">
      <title>RESULTS AND DISCUSSION</title>
      <sec id="sec3-1">
        <title>Microstructure and electronic properties</title>
        <p>Powdered specimens were characterized by XRD. <xref ref-type="fig" rid="fig1">Figure 1A</xref> presents the XRD patterns for NiO<sub>x</sub> and 10% Bi<sub>2</sub>Te<sub>3</sub>/NiO<sub>x</sub>. Three distinct diffraction peaks appear at 2θ = 37.1°, 43.2°, and 62.5°, corresponding to the (111), (200), and (220) planes of cubic NiO<sub>x</sub>, consistent with the reference values from the standard card (JCPDS No. 4-0835). In the XRD pattern of the 10% Bi<sub>2</sub>Te<sub>3</sub>/NiO<sub>x</sub> heterojunction, diffraction peaks appearing at 2θ = 27.6°, 41.2°, 50.2°, 57.1°, and 66.9° correspond to the (015), (110), (205), (0210), and (125) planes of trigonal Bi<sub>2</sub>Te<sub>3</sub> (JCPDS 82-0358), confirming the coexistence of both phases in the heterojunction. Notably, only NiO<sub>x</sub> and Bi<sub>2</sub>Te<sub>3</sub> diffraction peaks were observed, with no impurity phases detected, confirming the successful synthesis of the heterojunction.</p>
        <fig id="fig1" position="float">
          <label>Figure 1</label>
          <caption>
            <p>(A) XRD patterns of NiO<sub>x</sub> and 10% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub>, (B) TEM image of NiO<sub>x</sub>, (C) HRTEM micrographs of NiO<sub>x</sub>, (D) TEM image of 10% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub>, and (E) HRTEM micrographs of 10% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub>. XRD: X-ray diffraction; TEM: transmission electron microscopy; HRTEM: high-resolution TEM.</p>
          </caption>
          <graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="microstructures6045.fig.1.jpg" />
        </fig>
        <p>TEM analysis was conducted on NiO<sub>x</sub> and 10% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub>. <xref ref-type="fig" rid="fig1">Figure 1B</xref> reveals uniformly dispersed NiO<sub>x</sub> nanoparticles with grain sizes of 10-22 nm. The high-resolution TEM (HRTEM) image in <xref ref-type="fig" rid="fig1">Figure 1C</xref> (corresponding to the red-boxed area in <xref ref-type="fig" rid="fig1">Figure 1B</xref>) reveals crystal lattice spacings of 0.21 and 0.24 nm, corresponding to the (200) and (111) planes of NiO<sub>x</sub>, respectively. The TEM image in <xref ref-type="fig" rid="fig1">Figure 1D</xref> confirms the integration of Bi<sub>2</sub>Te<sub>3</sub> nanorods with NiO<sub>x</sub> nanoparticles in the 10% composite. The HRTEM image in <xref ref-type="fig" rid="fig1">Figure 1E</xref> illustrates a 0.22 nm lattice fringe assigned to Bi<sub>2</sub>Te<sub>3</sub> (110), in contact with the NiO<sub>x</sub> (200) plane, revealing the heterojunction microstructure of the 10% composite.</p>
        <p>SEM images [<xref ref-type="fig" rid="fig2">Figure 2A</xref>] illustrate pristine NiO<sub>x</sub> as flower-like aggregates of interconnected nanosheets, while energy-dispersive X-ray spectroscopy (EDS) mapping [<xref ref-type="fig" rid="fig2">Figure 2B</xref>] confirms uniform Ni distribution, indicating compositional homogeneity of the NiO<sub>x</sub> scaffold. After Bi<sub>2</sub>Te<sub>3</sub> introduction, the 10% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> composite presents a distinctly different morphology. <xref ref-type="fig" rid="fig2">Figure 2C</xref> presents rod-shaped Bi<sub>2</sub>Te<sub>3</sub> nanostructures (indicated by the yellow dashed boxes) dispersedly anchored onto NiO<sub>x</sub> nanoflower surfaces. EDS Ni mapping [<xref ref-type="fig" rid="fig2">Figure 2D</xref>] reveals uniform Ni distribution in NiO<sub>x</sub> regions, while Bi<sub>2</sub>Te<sub>3</sub> nanorods appear as Ni-free dark-contrast areas. EDS mappings for Bi [<xref ref-type="fig" rid="fig2">Figure 2E</xref>] and Te [<xref ref-type="fig" rid="fig2">Figure 2F</xref>] reveal that both elements are predominantly concentrated in the nanorod regions, matching the dark areas observed in the Ni map. EDS spectrum [<inline-supplementary-material content-type="local-data" mimetype="application/pdf" xlink:href="microstructures6045-SupplementaryMaterials.pdf">Supplementary Figure 2</inline-supplementary-material>] verifies the presence of Ni, O, Bi, and Te in the 10% composite, with no detectable impurities beyond the Si substrate. Quantitative analysis yields a Bi:Te atomic ratio of 2:3, confirming compositional homogeneity.</p>
        <fig id="fig2" position="float" width="550">
          <label>Figure 2</label>
          <caption>
            <p>(A) Top-view SEM image of NiO<sub>x</sub> and (B) the corresponding Ni EDS mapping; (C) SEM image of 10% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> and the corresponding EDS mappings for (D) Ni, (E) Bi, and (F) Te. The yellow dashed box highlights a Bi<sub>2</sub>Te<sub>3</sub>-dominated area. SEM: Scanning electron microscope; EDS: energy-dispersive X-ray spectroscopy.</p>
          </caption>
          <graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="microstructures6045.fig.2.jpg" />
        </fig>
        <p>To investigate the effects of Bi<sub>2</sub>Te<sub>3</sub> concentration on interfacial charge transfer, EIS was performed on all samples (0-15 wt% Bi<sub>2</sub>Te<sub>3</sub>). The spectra were simulated using the equivalent circuit (<xref ref-type="fig" rid="fig3">Figure 3A</xref>; inset), including electrolyte resistance and charge transfer resistance (Rct) at the nanocomposite interface, to extract key electrical parameters. Nyquist analysis demonstrates that R<sub>ct</sub> is minimized at 10% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> (0.74 × 10<sup>6</sup> Ω) compared with pure NiO<sub>x</sub> (1.50 × 10<sup>6</sup> Ω) and other ratios, indicating heterojunction formation for electron transfer. Higher Bi<sub>2</sub>Te<sub>3</sub> loadings likely cause agglomeration, increasing interfacial resistance. Optical Hall measurements [<xref ref-type="fig" rid="fig3">Figure 3B</xref>] reveal that carrier mobility fluctuates with Bi<sub>2</sub>Te<sub>3</sub> content rather than following a linear trend, suggesting it is more sensitive to localized synthesis variations and heterostructure quality than to Bi<sub>2</sub>Te<sub>3</sub> loading alone. The enhanced gas-sensing performance of the 10% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> sensor stems primarily from minimized interfacial charge transfer resistance and optimal heterojunction modulation, rather than bulk carrier mobility. This optimized interfacial property enables more efficient utilization of active sites, leading to superior sensing responses.</p>
        <fig id="fig3" position="float">
          <label>Figure 3</label>
          <caption>
            <p>(A) Impedance spectra and (B) carrier mobility of NiO<sub>x</sub> with different Bi<sub>2</sub>Te<sub>3</sub> concentrations (0, 1, 5, 10, and 15 wt%). Mobility values represent the averages of at least three independent measurements; vertical error bars indicate standard deviation.</p>
          </caption>
          <graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="microstructures6045.fig.3.jpg" />
        </fig>
      </sec>
      <sec id="sec3-2">
        <title>Gas sensitive properties</title>
        <p>To investigate the effect of Bi<sub>2</sub>Te<sub>3</sub> on NiO<sub>x</sub> gas sensitivity, pristine NiO<sub>x</sub> and the 10% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> composite were employed as sensitive layers and systematically evaluated with a dynamic testing system. Given the influence of operating temperature on gas sensor responses, the 10% Bi<sub>2</sub>Te<sub>3</sub>@ NiO<sub>x</sub> sensor was tested toward 10 ppm H<sub>2</sub>S at 30% RH across a range of temperatures. The sensor responses were 1.09, 1.32, 5.37, 11.81, and 5.14 at 30, 50, 70, 90, and 110 °C, respectively, peaking at 11.81 at 90 °C [<xref ref-type="fig" rid="fig4">Figure 4A</xref>]. This temperature was selected for all subsequent measurements. This trend is attributed to insufficient activation energy at low temperatures, limiting both charge carrier excitation and surface reactions. As temperature increases, these reactions are progressively promoted. However, excessively high temperatures suppress adsorption and reduce efficiency, causing a decline in response<sup>[<xref ref-type="bibr" rid="B17">17</xref>,<xref ref-type="bibr" rid="B18">18</xref>]</sup>.</p>
        <fig id="fig4" position="float">
          <label>Figure 4</label>
          <caption>
            <p>(A) Temperature-dependent response to 10 ppm H<sub>2</sub>S (30% RH), measured at 30, 50, 70, 90, and 110 °C; (B) Humidity-dependent H<sub>2</sub>S response at 90 °C; (C) Bi<sub>2</sub>Te<sub>3</sub> loading optimization for H<sub>2</sub>S detection (90 °C, 30% RH); (D) Response comparison of Bi<sub>2</sub>Te<sub>3</sub>@ NiO<sub>x</sub> sensor (error bars: SD, <italic>n</italic> = 5); (E) Response - recovery transient of 10% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> to 10 ppm H<sub>2</sub>S (first cycle); (F) Dynamic responses to varying H<sub>2</sub>S concentrations; (G) Concentration-response relationship (inset: linear range 0.2-4 ppm; stars: experimental data; red curve: nonlinear fit); (H) Selectivity toward 10 ppm of various gases; (I) Long-term stability tests. RH: Relative humidity.</p>
          </caption>
          <graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="microstructures6045.fig.4.jpg" />
        </fig>
        <p>To examine humidity effects, the sensor’s dynamic response to 10 ppm H<sub>2</sub>S at 90 °C was tested from 0% to 80% RH in 10% steps [<xref ref-type="fig" rid="fig4">Figure 4B</xref>]. The baseline resistance remains stable across humidity variations, reflecting satisfactory environmental stability. This notable humidity independence is attributed to the strong competitive adsorption of H<sub>2</sub>S, which exhibits a significantly higher affinity for active sites than H<sub>2</sub>O and dominates the adsorption process. The 90 °C operating temperature thermodynamically inhibits water physisorption. Based on this stability, 30% RH was selected as the baseline for all subsequent tests. Unlike idealized dry air (0% RH), 30% RH accurately simulates real ambient and industrial environments, making the assessment of selectivity and stability metrics more applicable to practical deployment.</p>
        <p>The effect of Bi<sub>2</sub>Te<sub>3</sub> loading on NiO<sub>x</sub> sensing performance was investigated via dynamic flow measurements [<xref ref-type="fig" rid="fig4">Figure 4C</xref>]. At 90 °C and 30% RH, responses to 10 ppm H<sub>2</sub>S for 0-15 wt% Bi<sub>2</sub>Te<sub>3</sub> were 1.47, 2.74, 4.3, 11.81, and 6.03, respectively [<xref ref-type="fig" rid="fig4">Figure 4D</xref>]. The 10% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> sensor demonstrated the highest response, attributed to an optimized p-n heterojunction effect. The Bi<sub>2</sub>Te<sub>3</sub>/NiO<sub>x</sub> interface generates a built-in field that promotes carrier separation and migration upon gas adsorption<sup>[<xref ref-type="bibr" rid="B19">19</xref>,<xref ref-type="bibr" rid="B20">20</xref>]</sup>, while the 10% loading minimizes interfacial defects that could impede mobility<sup>[<xref ref-type="bibr" rid="B21">21</xref>]</sup>. Bi<sub>2</sub>Te<sub>3</sub> doping also lowers sensor resistance via its high conductivity<sup>[<xref ref-type="bibr" rid="B21">21</xref>,<xref ref-type="bibr" rid="B22">22</xref>]</sup>; moderate doping enhances response, but excess doping over-enhances conductivity and suppresses gas adsorption, reducing sensitivity<sup>[<xref ref-type="bibr" rid="B20">20</xref>]</sup>.</p>
        <p>The response-recovery curve for 10 ppm H<sub>2</sub>S (first cycle, <xref ref-type="fig" rid="fig4">Figure 4C</xref>) is presented in <xref ref-type="fig" rid="fig4">Figure 4E</xref>, with response and recovery times of 970 s and 1,810 s, respectively. Dynamic transients of the 10% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> sensor to 0.2-50 ppm H<sub>2</sub>S were measured at 90 °C and 30% RH [<xref ref-type="fig" rid="fig4">Figure 4F</xref>]. The response scales positively with H<sub>2</sub>S concentration, enabling resistance-based concentration estimation, with the corresponding response values summarized in <xref ref-type="fig" rid="fig4">Figure 4G</xref>. Power-law fitting gave the relationship between response (<italic>y</italic>) and the H<sub>2</sub>S concentration (<italic>x</italic>): <italic>y = -</italic>11.76 + 17.78<italic>x</italic><sup>0.1</sup> (<italic>R</italic><sup>2</sup> = 0.97, where <italic>R</italic><sup>2</sup> near 1 indicates good fit). At low concentrations (0.2-4 ppm), a near-linear fit yielded: <italic>y =</italic> 4.04 + 1.04<italic>x</italic> (<italic>R</italic><sup>2</sup> = 0.927) (inset). The sensor response is defined as follows:</p>
        <p><disp-formula> <label>(1)</label> <tex-math id="E1"> $$ S_{{Bi}_{2} {Te}_{3} @ {NiO}_{x}}=R_{{H}_{2} {S}} / R_{a i r}  $$ </tex-math></disp-formula></p>
        <p>where <inline-formula><tex-math id="M1">$$  S_{{Bi}_{2} {Te}_{3} @ {NiO}_{x}} $$</tex-math></inline-formula> signifies the response value, <inline-formula><tex-math id="M2">$$  R_{H_2S} $$</tex-math></inline-formula> indicates the resistance in H<sub>2</sub>S, and <italic>R<sub>air</sub></italic> denotes the resistance in air.</p>
        <p>Sensor selectivity was evaluated against 10 ppm of acetone, ethanol, H<sub>2</sub>S, NO<sub>2</sub>, and formaldehyde at 90 °C and 30% RH [<xref ref-type="fig" rid="fig4">Figure 4H</xref>]. The 10% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> sensor demonstrates a distinctly higher response to H<sub>2</sub>S than to all interferents, exhibiting exceptional H<sub>2</sub>S selectivity. Long-term stability tests [<xref ref-type="fig" rid="fig4">Figure 4I</xref>] reveal a response fluctuation below 5% over a month, confirming reliable performance for continuous H<sub>2</sub>S monitoring. The initial slight increase in response over the first few days is due to surface activation and aging<sup>[<xref ref-type="bibr" rid="B23">23</xref>-<xref ref-type="bibr" rid="B25">25</xref>]</sup>, during which residual impurities desorb and chemisorbed oxygen species equilibrate, exposing additional active sites and marginally enhancing performance. After this brief activation, the sensor exhibits excellent long-term stability with negligible degradation, highlighting its practical applicability. Compared to recently reported low-temperature gas sensors, the Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> sensor exhibits markedly superior sensing performance [<inline-supplementary-material content-type="local-data" mimetype="application/pdf" xlink:href="microstructures6045-SupplementaryMaterials.pdf">Supplementary Table 1</inline-supplementary-material>].</p>
      </sec>
      <sec id="sec3-3">
        <title>Gas sensing mechanism</title>
        <p>These results indicate that Bi<sub>2</sub>Te<sub>3</sub> loading modulates sensor performance. To elucidate this mechanism, density functional theory (DFT) calculations were performed to determine the adsorption energy (<italic>E<sub>ads</sub></italic>) and charge density difference for H<sub>2</sub>S adsorption on NiO<sub>x</sub> and Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub>.</p>
        <p>Adsorption energy (<italic>E<sub>ads</sub></italic>), which quantifies interaction strength and adsorption difficulty, is calculated as follows:</p>
        <p><disp-formula> <label>(2)</label> <tex-math id="E2"> $$ E_{a d s}=E_{t o t a l}-E_{s u b}-E_{g a s} $$ </tex-math></disp-formula></p>
        <p>where <italic>E<sub>total</sub></italic>, <italic>E<sub>sub</sub></italic>, and <italic>E<sub>gas</sub></italic> present the free energies of the adsorption structure, substrate, and gas molecule, respectively. Negative <italic>E<sub>ads</sub></italic> denotes stable exothermic adsorption. Optimal H<sub>2</sub>S adsorption models on NiO<sub>x</sub> and Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> were constructed [<xref ref-type="fig" rid="fig5">Figure 5A</xref>]. Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> exhibited lower H<sub>2</sub>S <italic>E<sub>ads</sub></italic> than NiO<sub>x</sub>, suggesting stronger adsorption, which is key to enhanced sensing performance. Differential charge densities and Bader charges (Δ<italic>q</italic>) of adsorbed H<sub>2</sub>S were also evaluated. Differential charge density is given by:</p>
        <fig id="fig5" position="float" width="500">
          <label>Figure 5</label>
          <caption>
            <p>(A) H<sub>2</sub>S adsorption configurations and energies on NiO<sub>x</sub>(200) and Bi<sub>2</sub>Te<sub>3</sub> (110)/NiO<sub>x</sub>(200); (B) Charge density difference and Bader charges (Δq) for H<sub>2</sub>S adsorption (pink/blue: charge accumulation/depletion); (C and D) DFT-calculated band structures of Bi<sub>2</sub>Te<sub>3</sub> before (C) and after (D) H<sub>2</sub>S-adsorption (Dirac points in red); (E) Proposed H<sub>2</sub>S sensing mechanism for Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub>. DFT: Density functional theory.</p>
          </caption>
          <graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="microstructures6045.fig.5.jpg" />
        </fig>
        <p><disp-formula> <label>(3)</label> <tex-math id="E3"> $$ \Delta \rho=\rho_{t o t a l}-\rho_{l a y e r}-\rho_{g a s} $$ </tex-math></disp-formula></p>
        <p>where Δ<italic>ρ</italic> denotes the differential charge density; <italic>ρ<sub>total</sub></italic> signifies the total charge density of the adsorption system; and <italic>ρ<sub>layer</sub></italic> and <italic>ρ<sub>gas</sub></italic> represent the charge densities of the isolated substrate and gas molecule under identical conditions, respectively. The charge transfer between Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> and H<sub>2</sub>S increased to 0.13 e [<xref ref-type="fig" rid="fig5">Figure 5B</xref>], enhancing adsorption and amplifying the sensing response.</p>
        <p>Bi<sub>2</sub>Te<sub>3</sub>, a 3D topological insulator, exhibits Dirac points in its band structure. To investigate the impact of H<sub>2</sub>S adsorption on its energy band, we calculated the band structures of pristine Bi<sub>2</sub>Te<sub>3</sub> and H<sub>2</sub>S-adsorbed Bi<sub>2</sub>Te<sub>3</sub> using DFT on the (111) surface. Consistent with previous findings that reducing gas adsorption induces n-type doping in topological insulators, shifting Dirac points downward and raising the Fermi level<sup>[<xref ref-type="bibr" rid="B15">15</xref>]</sup>, our calculations reveal analogous behavior for H<sub>2</sub>S on Bi<sub>2</sub>Te<sub>3</sub>.</p>
        <p>Our DFT calculations [<xref ref-type="fig" rid="fig5">Figure 5C</xref> and <xref ref-type="fig" rid="fig5">D</xref>] exhibit a Dirac point at -0.1110 eV for pristine Bi<sub>2</sub>Te<sub>3</sub>, which downshifts to -0.1176 eV (Δ = -0.007 eV) upon H<sub>2</sub>S physisorption, confirming n-type surface doping. However, at the 90 °C operating temperature, bulk bands are expected to dominate the electronic transport of Bi<sub>2</sub>Te<sub>3</sub>, rather than the topological surface state alone. This subtle surface-state shift is nonetheless critical, as gas sensing is fundamentally interface-dominated. By analogy with chemical doping (e.g., Sb-doping) that alters the electronic structure of Bi<sub>2</sub>Te<sub>3</sub><sup>[<xref ref-type="bibr" rid="B26">26</xref>]</sup>, H<sub>2</sub>S physisorption locally perturbs surface states and catalytically lowers the activation energy for electron transfer. Upon H<sub>2</sub>S exposure, the enhanced response is driven synergistically by charge transfer across the p-NiO<sub>x</sub>/n-Bi<sub>2</sub>Te<sub>3</sub> heterojunctions, responsible for the primary resistance modulation, and Bi<sub>2</sub>Te<sub>3</sub>’s exceptionally high carrier mobility<sup>[<xref ref-type="bibr" rid="B20">20</xref>]</sup>. Uniform heating of the ultra-thin film on the micro-ceramic substrate further ensures a macroscopic isothermal condition throughout. The accelerated electron transfer is thus attributable solely to the interfacial p-n junction effect and surface state modulation, with no thermoelectric contributions from thermal gradients.</p>
        <p>N<sub>2</sub> adsorption-desorption measurements were performed on pristine NiO<sub>x</sub> and the 10% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> composite to ascertain whether performance enhancement stems simply from increased surface area. Both samples display type IV isotherms, confirming slit-like mesoporous structures. BET results [<inline-supplementary-material content-type="local-data" mimetype="application/pdf" xlink:href="microstructures6045-SupplementaryMaterials.pdf">Supplementary Figure 2</inline-supplementary-material>] yield specific surface areas of 12.81 m<sup>2</sup>/g for pristine NiO<sub>x</sub> and 12.98 m<sup>2</sup>/g for the 10% Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> composite. The marginal difference demonstrates that the incorporation of Bi<sub>2</sub>Te<sub>3</sub> exerts minimal influence on the physical surface area of the sensing material.</p>
        <p>A plausible H<sub>2</sub>S-sensing mechanism for Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub> is illustrated in <xref ref-type="fig" rid="fig5">Figure 5E</xref>. Upon exposure to H<sub>2</sub>S, the majority charge carriers (holes) on the NiO<sub>x</sub> surface interact with H<sub>2</sub>S gas molecules:</p>
        <p><disp-formula> <label>(4)</label> <tex-math id="E4"> $$ H_{2} S_{(g a s)} \rightarrow H_{2} S_{(a d s)} $$ </tex-math></disp-formula></p>
        <p><disp-formula> <label>(5)</label> <tex-math id="E5"> $$ H_{2} S_{(a d s)}+\mathrm{h}^{+} \rightarrow H_{2} S^{+} $$ </tex-math></disp-formula></p>
        <p>Upon H<sub>2</sub>S exposure, hole carriers at the NiO<sub>x</sub> surface are neutralized, resulting in a reduced carrier concentration and increased resistance. Concurrently, H<sub>2</sub>S adsorption on Bi<sub>2</sub>Te<sub>3</sub> induces a downward shift of its Dirac point, implying that the composite experiences both hole depletion on NiO<sub>x</sub> and n-type surface doping on Bi<sub>2</sub>Te<sub>3</sub><sup>[<xref ref-type="bibr" rid="B16">16</xref>]</sup>. This electron excitation further reduces the hole concentration in Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub>, leading to higher resistance (<inline-formula><tex-math id="M3">$$  R_{H_2S} $$</tex-math></inline-formula>) than that of NiO<sub>x</sub> under identical H<sub>2</sub>S exposure. Consistent with (1), the optimal Bi<sub>2</sub>Te<sub>3</sub> loading therefore maximizes the sensing response.</p>
        <p>Furthermore, Bi<sub>2</sub>Te<sub>3</sub>’s topologically protected surface states, safeguarded by time-reversal symmetry during gas doping<sup>[<xref ref-type="bibr" rid="B14">14</xref>,<xref ref-type="bibr" rid="B15">15</xref>]</sup>, suppress carrier backscattering from internal defects and thus significantly enhance carrier mobility in Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub>. This enhanced mobility promotes efficient charge transfer with H<sub>2</sub>S molecules, further improving sensing performance.</p>
      </sec>
    </sec>
    <sec id="sec4">
      <title>CONCLUSIONS</title>
      <p>This work synthesized non-stoichiometric NiO<sub>x</sub> for low-temperature H<sub>2</sub>S detection, contributing to the advancement of low-power detection. Bi<sub>2</sub>Te<sub>3</sub> loading modulated carrier properties, lowering initial resistance and promoting charge transfer with H<sub>2</sub>S. The 10% Bi<sub>2</sub>Te<sub>3</sub> sensor exhibited optimal performance, including excellent H<sub>2</sub>S selectivity. The response was 11.81 to 10 ppm H<sub>2</sub>S at 90 °C and 30% RH, with a 0.2 ppm detection limit and good long-term stability. The work not only clarifies the sensing mechanism of Bi<sub>2</sub>Te<sub>3</sub>@NiO<sub>x</sub>, but also opens new avenues for applying the topological material Bi<sub>2</sub>Te<sub>3</sub> in gas sensors, contributing to the advancement of low-power, high-performance detection technologies.</p>
    </sec>
  </body>
  <back>
    <sec>
      <title>DECLARATIONS</title>
      <sec>
        <title>Authors’ contributions</title>
        <p>Conception and design of the work: Wang, M.; Ding, W.</p>
        <p>Data acquisition and analysis: Ding, W.; Fan, R.; Han, C.; Cheng, Z.</p>
        <p>Data interpretation: Wu, C.; Yan, R.; Zou, W.; Yang, H.</p>
        <p>Manuscript writing and revising: Wang, M.; Ding, W.; Fan, R.</p>
        <p>Supervision: Cheng, Z.; Ma, X.; Li, L.; Pan, M.</p>
      </sec>
      <sec>
        <title>Availability of data and materials</title>
        <p>The raw data supporting the findings of this study are available within this Article and its <inline-supplementary-material content-type="local-data" mimetype="application/pdf" xlink:href="microstructures6045-SupplementaryMaterials.pdf">Supplementary Materials</inline-supplementary-material>. Further data is available from the corresponding authors upon reasonable request.</p>
      </sec>
      <sec>
        <title>AI and AI-assisted tools statement</title>
        <p>Not applicable.</p>
      </sec>
      <sec>
        <title>Financial support and sponsorship</title>
        <p>This work was supported in part by the National Nature Science Foundation of China under Grant 22372096, in part by the Key Research and Development Program of Wuhan City under Grants 2024050702030113 and 2024050702030134, in part by the Key Research and Development of the Hubei Provincial Technology Innovation Program (2025BAB043) and in part by the Wenzhou Basic Research Project (G20240043).</p>
      </sec>
      <sec>
        <title>Conflicts of interest</title>
        <p>All authors declared that there are no conflicts of interest.</p>
      </sec>
      <sec>
        <title>Ethical approval and consent to participate</title>
        <p>Not applicable.</p>
      </sec>
      <sec>
        <title>Consent for publication</title>
        <p>Not applicable.</p>
      </sec>
      <sec>
        <title>Copyright</title>
        <p>©The Author(s) 2026.</p>
		 </sec>
      <sec sec-type="supplementary-material">
        <title>Supplementary Materials</title>
        <supplementary-material content-type="local-data">
          <media xlink:href="microstructures6045-SupplementaryMaterials.pdf" mimetype="application/pdf">
            <caption>
              <p>Supplementary Materials</p>
            </caption>
          </media>
        </supplementary-material>
      </sec>
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